NanoMaker-Editor Build: Jun 2, 2
NanoMaker is a powerful software/hardware system for SEM/FIB based lithography that is intended for state-of-the-art technology of designing and manufacturing micro and nano electronic devices and objects.Trial version of NanoMaker-Editor is ...
Last update
25 Jul. 2010
Licence
Free to try |
$44.95
OS Support
Windows
Downloads
Total: 1,063 | Last week: 4
Ranking
#54 in
Mathematics
Publisher
St Services
NanoMaker-Editor Publisher's Description
NanoMaker is a powerful software/hardware system for SEM/FIB based lithography that is intended for state-of-the-art technology of designing and manufacturing micro and nano electronic devices and objects.
Trial version of NanoMaker-Editor is limited to number of elements in structure to be exported.
Why NanoMaker? NanoMaker provides a unique set of possibilities for nanotechnologies.- It is supplied with friendly graphic editor to design hierarchical structures of any size and shape arranged to any level of complexity.
- Makes simulation of resist development.
- Calculates exposure dose values/times considering proximity effect correction for 2D/3D structures.
- Compensates static distortion of e-beam deflecting system.
- Significantly reduces total exposure time by actively suppressing dynamic delays of e-beam deflection.
- Can be used as diagnostic tool for creation of high-resolution panoramic view of large-scale (centimeters) micro objects.
- To convert any scanning electron microscope (SEM) into an e-beam lithograph.
- To provide an ultimate resolution of lithography with a certain setup (including industrial lithographs). To achieve this:
- make correction for proximity effect during data preparation for lithography
- compensate for the distortion and delays of scanning system during exposure and image acquisition
- compensate for the system drift at prolonged exposure
- To predict results of lithography by simulating.
- To ensure adjustment for various configurations of lithographic equipment, for the presence or absence of beam blanking systems, stages, etc.
- To create three-dimensional structures in a resist.
- To familiarize user with the basic principles of lithography.
Scanning Electron Microscope controlled by
NanoMaker
- Microelectronics
- Nanotechnology
- 3D nano-micro patterning
- Diffractive optics (synthetic holograms) for visible and X-ray range
- Digital microscopy
- SEM's (JEOL, LEO, ZEISS, HITACHI, PHILIPS, FEI, TESCAN,...)
- Focused Ion Beam machines
- STM/AFM's
- i486 or Pentium-class processor
- Microsoft Windows 98/Me/NT 4.0/2000/XP
- 64 MB of RAM
- 20 MB of available hard-disk space
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